粉末原子層沉積系統(tǒng) ALD
美國ALD NANOSOLUTIONS公司技術(shù)，專注于粉末顆粒表面鍍膜。
專用于在粉末、顆粒表面沉積ALD薄膜，可用于科研，生產(chǎn)。單批次體積從45ml~150L，滿足科研到生產(chǎn)的需要?？沙练e氧化物，氮化物，金屬等類型薄膜?？捎糜阡囯x子電池、催化劑、等需要粉末鍍膜的行業(yè)。
專業(yè)的粉末鍍膜原子層沉積系統(tǒng)，為科研與生產(chǎn)提供專業(yè)的解決方案。
設(shè)備沉積方法有：流化床法、滾動法、振動法。
粉末原子層沉積系統(tǒng)型號:
FX系列：75 or 150 mL，適用于R&D
FP系列: 500 mL / 2 L / 5 L / 10 L，適用于R&D，生產(chǎn)
RX系列：10 or 40 mL， 適用于R&D
RP系列： ~40L, 適用于生產(chǎn)
CVR系列：15L/hr to 150L/hr，適用于生產(chǎn)
粉末原子層沉積系統(tǒng)技術(shù)參數(shù)：
ALD REACTOR SYSTEMS | Fluidized | Rotary Reactors (Rotary) | Continuous Vibrating Reactors (CVR) | ||||||
Substrate Volume | 75mL to 10L per batch | 10ml to 40L | 15L/hr to 150L/hr | ||||||
Substrate Mass | 75g - 12.5kg per batch | 10g - 50kg per batch | 15kg/hr to 150kg/hr | ||||||
Vapor Draw Sources | 2 standard, | 2 standard, | 2 standard, | ||||||
Regulatory Compliance | CE, GMP and ISO compliance upon request | ||||||||
Weight | 300 lbs - | 300lbs - 4,000lb (150kg | 500lbs - 8,000lb (250kg - 4000kg) | ||||||
Venting Emissions and Abatement | Equipment can be designed to comply with local jurisdiction codes and regulations | ||||||||
Electrical Requirements | Project-specific and customized. Further details can be supplied upon request | ||||||||
Demonstrated Particle Diameters | 10 nm - 500micron | 10 nm - 200micron | 5-50micron | ||||||
Potential Particle Diameters | 2 nm - 1mm | 2 nm - 250px | 10nm - 1 cm | ||||||
Other Features | Highest Precursor Efficiency | Plasma ALD Compatible | Atmospheric Pressure Operation | ||||||
Fluidization Reactor – Experimental Series (FX)
Reactor Style: | Fluidization Reactor |
Substrate Volume: | 75 or 150 mL |
Reactor Temperatures Range: | 25 – 450 °C |
Maximum Process Line Temperatures: | 200 °C |
Vapor Draw Sources: | 2 standard, up to 4 |
Dosing Valves: | Heated Metal Diaphragm |
Vacuum Pump: | Rotary Vane (9 CFM or greater) |
Regulatory Compliance: | CE Marked |
Weight: | 300 lbs/ 140 kg |
Options Available: | Substrate Loading Low Vapor Pressure Containers capable of 150 °C Residual Gas Analyzer Waste Abatement Glovebox Research License for ALD on Particles Various Vapor Sources |
Fluidization Reactor – Pilot Series (FP)
Reactor Style: | Fluidization Reactor |
Substrate Volume: | 500 mL / 2 L / 5 L / 10 L |
Reactor Temperatures Range: | 25 – 450 °C |
Maximum Process Line Temperatures: | 200 °C |
Vapor Draw Sources: | 2 standard, up to 8 |
Dosing Valves: | Heated Metal Diaphragm |
Vacuum Pump: | Rotary Vane (9 CFM or greater) |
Regulatory Compliance: | CE Marked |
Weight: | 400 lbs/ 180 kg |
Options Available: | Substrate Loading Low Vapor Pressure Containers capable of 150 °C Residual Gas Analyzer Waste Abatement Research License for ALD on Particles Various Vapor Sources |
Rotary ALD Reactor – Pilot Series (RP)
Reactor Style: | Rotary Reactor |
Substrate Volume: | ~40 L |
Reactor Temperatures Range: | 25 – 200 °C |
Maximum Process Line Temperatures: | 200 °C |
Vapor Draw Sources: | 2 standard, up to 8 |
Dosing Valves: | Heated Metal Diaphragm |
Vacuum Pump: | Rotary Vane (9 CFM or greater) |
Regulatory Compliance: | CE Marked |
Weight: | 500 lbs/ 230 kg |
Options Available: | Substrate Loading Low Vapor Pressure Containers capable of 150 °C Residual Gas Analyzer Waste Abatement Integrated Glovebox Research License for ALD on Particles Various Vapor Sources |
Rotary ALD Reactor – Experimental Series (RX)
Reactor Style: | Rotary Reactor |
Substrate Volume: | 10 or 40 mL |
Reactor Temperatures Range: | 25 – 200 °C |
Maximum Process Line Temperatures: | 200 °C |
Vapor Draw Sources: | 2 standard, up to 8 |
Dosing Valves: | Heated Metal Diaphragm |
Vacuum Pump: | Rotary Vane (9 CFM or greater) |
Regulatory Compliance: | CE Marked |
Weight: | 300 lbs/ 140 kg |
Options Available: | Substrate Loading Plasma Source from Meaglow Low Vapor Pressure Containers capable of 150 °C Residual Gas Analyzer Waste Abatement Integrated Glovebox Research License for ALD on Particles Various Vapor Sources |
